Chemistry of Photolithography
Автор:
Jesse Russell,Ronald Cohn, 91 стр., издатель:
"Книга по Требованию", ISBN:
978-5-5143-8654-3
High Quality Content by WIKIPEDIA articles! Photolithography is a process in removing select portions of thin films used in the microfabrication. Microfabrication is the production of parts on the micro- and nano- scale, typically on the surface of silicon wafers for the production of microelectromechanical systems (MEMS). Photolithography makes this process possible through the combined used of hexamethyldisilazane (HMDS), photoresist (positive or negative), spin coater, photomask, an exposure system and other various chemicals. By carefully manipulating these factors it is possible to create nearly any geometry microstructure on the surface of a silicon wafer. The chemical interaction between all the different components and the surface of the silicon wafer makes photolithography an interesting chemistry problem. Current science has been able to create features on the surface of silicon wafers between 1-100?m. Данное издание представляет собой компиляцию сведений, находящихся в...
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