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Fundamental Principles of Optical Lithography. The Science of Microfabrication

Fundamental Principles of Optical Lithography. The Science of Microfabrication

Автор: Chris Mack, 534 стр., серия: "Electronic Materials / Semiconductors", издатель: "John Wiley & Sons, Inc", ISBN: 978-0-470-72730-0

This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. This text comprises of ten detailed chapters as well as three appendices which provide problems at the end of each chapter. From the Contents: 1 - Introduction to Semiconductor Lithography 2 - Aerial Image Formation 3 - Standing Waves and Swing Curves 4 - Photoresist Exposure and Amplification Kinetics 5 - Photoresist Bake Effects 6 Photoresist Development 7 Critical Dimension Control 8 Resolution Enhancement Technologies 9 Lithography Simulation 10 Future Developments Описание: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. This book presents a theoretical and practical treatment of the topic of lithography.
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